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November 12, 2010

Looking to Fill Your Ethics, Professionalism and Substance Abuse Requirements?

~ written by Elizabeth Maag

Join the Columbus Bar Intellectual Property Committee and the Columbus Intellectual Property Law Association on Monday, November 22, 1:30pm – 4:15pm for 2.5 hours of an Intellectual Property focused Ethics, Substance Abuse, and Professionalism CLE.

The program will begin with Megan Snyder from OLAP who will educate attendees about the definitions and treatment options for substance abuse and chemical dependency. She will also discuss mental health issues such as depression and anxiety.

The second presenter, Alvin Mathews of Bricker & Eckler, will be addressing how to ethically use Social Media. Alvin’s presentation will instruct attendees how to use social media ethically in advertising and solicitation of clients. He will cover how the practitioner can ethically communicate with clients or potential clients via Social Media and how to avoid any confidentiality and/or conflicts of interest when using Social Media. He will also highlight the ethical problems and employment issues to avoid when using Social Media.

The final presenter, Sam Lillard of McNees Wallace & Nurick, will instruct attendees on professionalism and the practice of law, pointing out how to avoid the use of deception in collecting evidence in IP related cases. His presentation will conclude with pointers and tips for the practitioner on how to remain professional when others are not.

Register online or over the phone at 614/221.4112.

Seminar organizers are Elizabeth Maag and Keith McCarthy.